These are the most frequently used words in this book.
100
adhesion
amorphous
applications
arc
beam
between
carbide
carbon
case
cathode
chemical
coating
coefficient
cutting
cvd
density
deposited
deposition
depth
diamond
due
during
eds
effect
electron
energy
et
evaporation
example
fig
figure
films
force
friction
gas
grain
growth
hard
hardness
high
higher
however
hydrogen
increase
indentation
indenter
interface
ion
laser
layers
load
low
materials
may
measurement
mechanical
metal
methods
nitride
parameters
particles
phase
plasma
pressure
process
properties
pvd
rate
reactive
results
scratch
shown
since
size
solid
source
sputtering
steel
stress
structure
substrate
surface
system
target
techniques
technology
temperature
test
thermal
thin
tin
tion
tools
two
used
values
vapor
various
wear